Intel pushes forward with the world’s first commercial High-NA EUV lithography machine installation Intel has confirmed that it has installed ASML’s Twinscan EXE:5200B, the industry’s first High-NA lithography tool for commercial chip production. The tool has now passed “acceptance testing”, and will be used to develop Intel’s next-generation lithography nodes. Intel’s 14A node could be […]

The post Intel jumps ahead with next-gen High NA EUV machine install appeared first on OC3D.

Chinese scientists build a working EUV prototype, striking a major blow against America’s semiconductor leadership The US has placed heavy restrictions on tech exports to China, hoping to slow down the nation’s progress and limit the growth of its tech sector. Specifically, the US wants to prevent China from making cutting-edge semiconductors, keeping its chips […]

The post China sidesteps US ban with EUV chipmaking breakthrough appeared first on OC3D.