ASML Boosts EUV Power to 1,000W for Better Yields and Lower Chip Costs
23 February 2026 at 19:28
ASML says it has boosted the light source power in its EUV lithography systems to 1,000 watts, up from roughly 600 W today. According to a Reuters report, the company claims the increase could enable up to 50% more chip output by the end of the decade. More source power translates directly into higher throughput. ASML says customers could process around 330 wafers per hour by 2030, compared to about 220 wafers per hour today, lowering the cost per chip. EUV light at a 13.5 nm wavelength is generated by firing a CO₂ laser at microscopic droplets of molten tin, creating plasma that emits EUV radiation. The light is then collected and directed through precision optics supplied by Carl Zeiss AG. To reach 1,000 W, ASML doubled the droplet rate to roughly 100,000 per second and shifted to a two-pulse laser shaping approach instead of a single pulse. The company says there is a path toward 1,500 W and potentially even 2,000 W over time.
ASML is the only supplier of commercial EUV scanners, used by major chipmakers including TSMC, SK Hynix, and Intel. The tools are considered critical to advanced node production and have been subject to export restrictions to China. The move is aimed at maintaining ASML's lead as U.S. companies, such as Pat Gelsinger's xLight EUV startup and Chinese efforts to develop competing lithography systems continue to ramp. Chinese companies have reportedly been sourcing parts from older ASML machines through secondary markets. Huawei is leading the charge, working to build a homegrown AI supply chain as a way around foreign tech restrictions. The company set up a large semiconductor manufacturing facility in Guanlan focused on 7 nm chips for its own processors. The Chinese government had initially aimed to have a working prototype from this effort by 2028.
ASML is the only supplier of commercial EUV scanners, used by major chipmakers including TSMC, SK Hynix, and Intel. The tools are considered critical to advanced node production and have been subject to export restrictions to China. The move is aimed at maintaining ASML's lead as U.S. companies, such as Pat Gelsinger's xLight EUV startup and Chinese efforts to develop competing lithography systems continue to ramp. Chinese companies have reportedly been sourcing parts from older ASML machines through secondary markets. Huawei is leading the charge, working to build a homegrown AI supply chain as a way around foreign tech restrictions. The company set up a large semiconductor manufacturing facility in Guanlan focused on 7 nm chips for its own processors. The Chinese government had initially aimed to have a working prototype from this effort by 2028.