(PR) Imec Receives the World's Most Advanced High NA EUV System
18 March 2026 at 22:32
Today, imec, a world-leading research and innovation hub in advanced semiconductor technologies, announces the arrival of the ASML EXE:5200 High NA EUV lithography system, the most advanced lithography tool available today. With this strategic milestone, imec reinforces its position as the industry's launchpad into the ångström era, giving its global partners ecosystem unparalleled early access to the next generation of chip-scaling technologies. Integrated directly with a comprehensive suite of patterning and metrology tools and materials, the High NA EUV system will empower imec and its ecosystem partners to unlock the performance needed to pioneer sub-2 nm logic and high-density memory technologies that will fuel the rapid growth of advanced AI and high-performance computing.
Luc Van den hove, CEO of imec: "The past two years have marked an important chapter for High NA (0.55NA) EUV lithography, with imec and ASML joining forces with the ecosystem in its joint High NA EUV Lithography Lab in Veldhoven (The Netherlands) to pioneer High NA EUV technology. With the installation of the EXE:5200 High NA EUV lithography system into our 300 mm cleanroom in Leuven (Belgium), we aim to bring these High NA EUV patterning technologies to an industry-relevant scale and to develop the next-generation High NA EUV patterning use cases. Its unmatched resolution, improved overlay performance, high throughput, and a new wafer stocker that improves process stability and throughput, will give our partners a decisive advantage in accelerating the development of sub-2 nm chip technologies. As the industry moves into the ångström era, High NA EUV will be a cornerstone capability, and imec is proud to lead the way by offering its partners the earliest and most comprehensive access to this technology."
Luc Van den hove, CEO of imec: "The past two years have marked an important chapter for High NA (0.55NA) EUV lithography, with imec and ASML joining forces with the ecosystem in its joint High NA EUV Lithography Lab in Veldhoven (The Netherlands) to pioneer High NA EUV technology. With the installation of the EXE:5200 High NA EUV lithography system into our 300 mm cleanroom in Leuven (Belgium), we aim to bring these High NA EUV patterning technologies to an industry-relevant scale and to develop the next-generation High NA EUV patterning use cases. Its unmatched resolution, improved overlay performance, high throughput, and a new wafer stocker that improves process stability and throughput, will give our partners a decisive advantage in accelerating the development of sub-2 nm chip technologies. As the industry moves into the ångström era, High NA EUV will be a cornerstone capability, and imec is proud to lead the way by offering its partners the earliest and most comprehensive access to this technology."
