Samsung’s new 3D transistor design could improve future chip performance
Samsung has reportedly achieved a 3D transistor design milestone, which could reshape and improve future chip performance. The company continues to expand its technological footprint, along with nurturing the Foundry and LSI divisions.
According to ZDNet (via SemiconductorsX), Samsung walked away from VLSI 2026 with the Best Paper award after presenting a 3D Stacked FET design that squeezes more transistors into less space than anything the industry has managed before.
Samsung’s design piles transistors on top of each other, slashing the footprint in half and theoretically doubling density in a single architectural move.
The score was 8.29 out of 10 across a pool of over 1,000 submissions. The company also pushed the gate pitch, the horizontal width of each transistor, down to 42nm from 48nm.
Samsung’s own V-NAND flash and HBM memory both live in three dimensions. The company’s Foundry business has taken serious hits over the past two years.
Yield problems, lost clients, and a general sense that the gap between Samsung and TSMC was widening rather than closing. A Best Paper at VLSI doesn’t fix a fab, but it signals that the engineering talent is still in the building.

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